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Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity

Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity

Regular price $130.00 USD
Regular price Sale price $130.00 USD

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About this item

  • Customization: custom geometries (planar, rotary, ring), thicknesses and mounting interfaces, tailored purity and dopants, and bonding options (diffusion bonding, brazing, conductive epoxy) for direct fit to sputter fixtures
  • Microstructure control: engineered bulk density and narrow grain-size distribution to minimize film porosity and surface roughness for dense, low-resistivity sputtered films
  • Material scope: manufactured for metals, alloys, ceramics and composites, including refractory and insulating compositions compatible with DC/RF and magnetron sputtering
  • Targeted applications: optimized for magnetron sputtering in semiconductor fabrication, OLED/display stacks, photovoltaic coatings and optical, barrier and seed layers used in research and pilot-scale laboratory systems
Processing: 5-15 business days.
Shipping: 3-7 business days.

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