• Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity Sputtering Target
  • Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity Sputtering Target
  • Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity Sputtering Target
  • Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity Sputtering Target
  • Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity Sputtering Target
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Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity

Silicon (Si) Sputtering Target, N-Type / P-Type / Intrinsic, 99.999% Purity

$130.00 USD
$130.00 USD
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About this item

  • Customizable Options: Specifications, shapes, sizes, purity, and bonding methods available.
  • High Performance: High purity, high density, and uniform grain for superior film quality.
  • Wide Material Range: Metals, nonmetals, alloys, and ceramics to meet diverse needs.
  • Applications: Ideal for thin film deposition in semiconductors, display panels, solar cells, and other fields, delivering high-performance coatings through sputtering.
Processing: 5-15 business days.
Shipping: 3-7 business days.

1-Year Free Warranty

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